Anexo Para Z-esquema de División de Agua Utilizando Semiconductores de Partículas Inmoviliza Sobre...

download Anexo Para Z-esquema de División de Agua Utilizando Semiconductores de Partículas Inmoviliza Sobre Capas de Metal Para Relé de Electrones Eficiente

of 8

Transcript of Anexo Para Z-esquema de División de Agua Utilizando Semiconductores de Partículas Inmoviliza Sobre...

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    1/8

    Appendices

    Figure A.1. A typical time course of photodeposition of the cocatalyst Ru on a

    SrTiO3:La,Rh/Au/BiVO4plate. Reaction conditions: reactant solution, distilled water

    (40 mL) containing RuCl33H2O (0.35 mol) without pH adjustment; light source,

    300 W xenon lamp ( > 420 nm); irradiation area: 9 cm2.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    2/8

    Figure A.2.The power spectra of the solar simulator used in the experiments and the

    standard AM1.5D and AM1.5G.

    Figure A.3.SEM images of (a) SrTiO3:La,Rh and (b) BiVO4powders.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    3/8

    Figure A.4. The dependence of the photocatalytic activity of (SrTiO3:La,Rh)(BiVO4)

    powder suspension systems on the amounts of SrTiO3:La,Rh and BiVO4. Catalysts:

    520 mg each, reaction solution: 40 mL water adjusted to pH 3.5 with H2SO4; light

    source, 300 W xenon lamp ( > 420 nm), irradiation area: 13 cm2. The gas evolution

    rates were divided by the irradiation areas.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    4/8

    Figure A.5. The dependence of the photocatalytic activity of

    SrTiO3:La,Rh/Au/BiVO4plates on the thickness of gold layers. Reaction conditions:

    reaction solution, distilled water (40 mL) without pH adjustment (pH 6.8); light

    source, 300 W xenon lamp ( > 420 nm); irradiation area: 9 cm2. Photodeposition

    process was carried out from an aqueous solution (40 mL) containing RuCl33H2O

    (0.35 mol) without pH adjustment under 300 W xenon lamp ( > 420 nm)

    illumination. The gas evolution rates were divided by the irradiation area.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    5/8

    Figure A.6. (a) A diffuse-reflectance spectrum and (b) photograph of a Au layer

    deposited on a glass plate by vacuum evaporation.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    6/8

    Figure A.7.Mott-Schottky plots of a SrTiO3:La,Rh electrode. The measurement was

    carried out under darkness at a frequency of 1 kHz with an AC amplitude of 10 mV in

    a 0.1 M aqueous Na2SO4 solution at pH 6.8. Before the measurement, oxidation

    reduction cycles was performed repeatedly to stabilize the surface of the

    SrTiO3:La,Rh electrode.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    7/8

    Figure A.8. Time course of H2 and O2 evolution during Z-scheme water splitting

    using a SrTiO3:La,Rh/Au/BiVO4 plate after photodeposition. Reaction conditions:

    reaction solution, distilled water (40 mL) without pH adjustment (pH 6.8); light

    source, 300 W xenon lamp ( > 420 nm); irradiation area: 9 cm2. Photodeposition

    process was carried out

    from an aqueous solution (40 mL) containing RuCl33H2O

    (0.35 mol) without pH adjustment under 300 W xenon lamp ( > 420 nm)

    illumination.

  • 7/25/2019 Anexo Para Z-esquema de Divisin de Agua Utilizando Semiconductores de Partculas Inmoviliza Sobre Capas de

    8/8

    Table A.1. The number of incident photons from a Xe lamp through band-pass filters.

    Central wavelength / nm The number of incident photons / photon h-1

    417.2 2.61020

    435.1 2.810

    20

    471.3 2.91020

    499.6 2.71020